Electron Beam Power Supply
- Ultra-low ripple
- high stability
- Accelerator voltage
-10 kV to -60 kV - Selectable each floating channel output
All-in-One High-Voltage Power Supply for E-Beam Applications
The HEB series is a multi-output high-voltage power supply engineered specifically for scanning electron microscopes (SEM), e-beam lithography, and other electron gun applications. It integrates all necessary power sources—including acceleration voltage, filament, suppressor, extractor, and focus—into a single, compact enclosure.
Designed for high-resolution imaging and precise beam control, the HEB series delivers ultra-low ripple and exceptional stability. The system allows for flexible configuration; each floating output channel can be individually selected to meet specific user requirements. Additionally, the unit supports digital control via optical fiber isolation, ensuring safe and reliable operation in demanding research and industrial environments.
Equipped with standard features like digital control via an optical fiber link and comprehensive protection circuits, the HEB series supports both advanced control and safe operation. Backed by Matsusada Precision's renowned quality and reliability, this power supply is the ideal partner to enhance your R&D and improve your equipment's performance.
FEATURES AND BENEFITS
- Ultra-Low Ripple and High Stability: Optimized for high-resolution SEM and e-beam applications.
- Wide Acceleration Voltage Range: Standard models support -10 kV to -60 kV (up to -160 kV available upon request).
- Integrated Multi-Channel Output: Combines floating levels (Filament, Suppressor, Extractor, Focus) and ground levels (Accelerator) in one unit.
- Customizable Configuration: Floating output channels can be selected and configured to match specific system needs.
- High Stability Options: Standard temperature coefficient of 25 ppm/°C, with high-stability 10 ppm/°C models available.
- Enhanced Safety: Features fiber-optic galvanic isolation for secure remote digital control.
- Compact Design: Reduces system footprint and simplifies integration.
APPLICATIONS
- Scanning Electron Microscopes (SEM)
- Critical Dimension SEM (CD-SEM) and Defect Review SEM (DR-SEM)
- Electron Beam Lithography (EBL) systems
- Semiconductor fabrication equipment
- Auger Electron Spectroscopy (AES) and Surface analysis instruments
- Microfocus X-ray generators
Models
| Model | Ch. Name | Reference level | Output | |
|---|---|---|---|---|
| Voltage | Current | |||
| HEB series | Filament | Accelerator | +2 V, +8 V, and so on | 3 A, 5 A |
| Suppressor | Accelerator | -1 kV, -2 kV, and so on | 50 µA, 100 µA | |
| Extractor | Accelerator | +5 kV, +10 kV, -10 kV and so on | 500 µA, 3 mA and so on | |
| Focus | Accelerator | +2 kV, +5 kV, and so on | 50 µA, 1000 µA and so on | |
| Accelerator | Ground | -10 kV, -30 kV, -60 kV and so on | 100 µA, 700 µA and so on | |
| Focus | Ground | + 30 kV | 50 µA | |
| Grid | Ground | - 10 kV | 50 µA | |
Specifications
- Input voltage
- 85 to 264 Vac, 50/60 Hz, Single-phase
- Output voltage control
-
[Local] Rotary encoder and keypad on the front panel (each channel)
[Digital remote] Command
Options
- -LFC
Filament (ch1) center common
Dimensions
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HEB series Datasheet
Date: 2025-10-21 rev 10
PDF (1,766 KB)
-
Safety and Usage of High voltage Power supply
Date: 2025-09-08 rev 04
PDF (602 KB)
-
High Performance High Voltage Power Supplies
Date: 2023-10-06 rev. 12
PDF (3,886 KB)
Login Required
-
HEB series Datasheet
Date: 2025-10-21 rev 10
PDF (1,766 KB)
-
Safety and Usage of High voltage Power supply
Date: 2025-09-08 rev 04
PDF (602 KB)
-
High Performance High Voltage Power Supplies
Date: 2023-10-06 rev. 12
PDF (3,886 KB)
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