Electron beam lithography is the application of electron beam processing equipment and scanning electron microscope technology to make semiconductor reticles used in the production of LSIs. Electron beam lithography is also called e-beam lithography (EB lithography) or EBL. The reticle, also called a photomask, plays a role similar to a photographic film as a base plate for transferring the circuit pattern of electronic components to a wafer or other object to be transferred.

In electron beam lithography, an electron beam (E beam) emitted from an electron gun is focused into a very small spot by an electron lens. By controlling the movement of the converged electron beam and the movement of the stage according to the lithography pattern, electron lithography is performed on the lithography material. The control of the electron beam and stage is based on the technology of electron beam processing equipment and scanning electron microscopes.

Electron Beam Lithography (EBL)

A high-precision, high-voltage power supply is required to operate the electron gun and electron lenses required for electron beam lithography equipment.

Matsusada Precision offers power supplies for electron guns and electron lenses for electron beam lithography equipment. These high-voltage power supplies can also be customized to meet customer requirements.

Related words:
  • electron gun
  • electron beam
  • electron drawing
  • electron lens