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Sputtering is one of the coating methods of Physical Vapor Deposition (PVD) that can produce a thin film metal coating on the surface of a material by physical effects.

It involves introducing a controlled gas, such as argon, and a material which is called the target for thin film coating. When a negative voltage is applied to the target to generate a glow discharge, the inert gas plasma impinges on the target surface at high speed.

Then, the atoms are sputtered out of the target. This process is called sputtering; the ejected atoms vigorously adhere to the substrate.

Sputtering is one of the most efficient systems to obtain film thickness distribution, and it has the ability to control film quality and thickness with high precision. The sputtering deposition is suitable for high-melting-point metals and alloys, and it can also create a thin, precise coating of oxides and nitrides by using a reactive gas.

The sputtering method has many applications in semiconductor wiring, barrier films, and transparent conductive films used for smartphones and tablets. It also provides beautiful appearance processing for car headlight reflectors and decorative films.

Sputtering | Matsusada Precision
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There are two methods of sputtering: a DC (direct current) power supply for sputtering and an RF (radio frequency) power supply. Both DC and RF can be used for metal targets for sputtering deposition. However, when using insulators as targets, it is necessary to use a high-frequency power supply for sputtering because no discharge occurs with DC. Matsusada Precision's standard products take no countermeasures against arc handling and abnormal discharge for sputtering. Customers who intend to use these products for sputtering applications should contact our sales office in advance.
Matsusada Precision offers power supply solutions for vacuum and deposition process applications. We also manufacture other products, such as electrostatic chucks and piezo drivers in semiconductor and FPD manufacturing equipment.

RE series

RE series

voltage range
10 to 650 V
current
1.2 to 1200 A
power
0.75 to 15 kW
147 models, programmable DC Power Supply

Low noise, High power, compact and high efficiency

REH series

REH series

voltage range
0.75 to 1.2 kV
current
1.1 to 20 A
power
1.1 to 15 kW
Max 1.2 kV high voltage and high power
DC Power Supply

Safety design, Outstanding small size in its class of 1kV/15kW

REK/REKJ series

REK/REKJ series

voltage range
6 to 1500 V
current
1.2 to 1200 A
power
0.77 to 15 kW
Versatile, High-performance
DC power supply

Compact and High power, PFC circuit and universal input. Various operations are available

PRT series

PRT series

voltage range
80 to 1500 V
current
33 to 510 A
power
5 to 15 kW
High Power Autoranging DC Power Supply

Achieve a autoranging of output, Variable internal resistance function

New

HARS series

HARS series

voltage range
1 to 120 kV
current
4 to 3000 mA
power
0.5 to 3 kW
Low-Profile Digital High Voltage Power Supply

Get fully equipped protection from the low-ripple HARS series with 4-digit digital meter.

AU series

AU series

voltage range
1 to 120 kV
current
0.25 to 2200 mA
power
30 to 2200 W
Rack-mount type High Voltage Power Supply

Choose from over 300 available models of the low-profile, lightweight design from the AU series, offering remote control & monitor functions; digital interface available.

AK series

AK series

voltage range
1 to 120 kV
current
25 to 4250 mA
power
3 to 6.4 kW
High power 6.4 kW/Compact
High Voltage Power Supply

Browse over 100 available models of the AK series, with high power 6.4 kW/Compact. 6.4 kW in 4 U. Digital interface is available.

AKP series

AKP series

voltage range
1 to 120 kV
current
0.1 to 13 A
power
12 to 13 kW
High Power High Voltage power supply

Further optimize extension up to 52kW with the AKP series’ propriety master/slave function.

NEW

HECD series

HECD series

Voltage range
±0.5 to ±7.5 kV
Current
1 to 20 mA
Power
4 to 10 W
for Electrostatic chuck

Wafer Sensor adopted. Two-channels output type.