Ion implantation is a method of changing the properties of a solid or modifying its surface by accelerating and injecting ionized atoms or molecules into the solid. In particular, the method of implanting impurity elements to form semiconductors, called dopants, is called doping technology, and is the most widely used method of ion implantation.
A typical ion implanter consists of several parts, including an ion source to generate the target ions, a mass spectrometry to extract the necessary ions, an accelerator tube to accelerate the ions, a scanning section to scan the ion beam, and a section to detect the dose. The end station, where ions are injected into the solid, is under high vacuum conditions.
Matsusada Precision offers a wide variety of high voltage power supplies such as high voltage filament power supplies for ion sources, high voltage power supplies for extraction grids, constant current power supplies for analyzer magnets, high voltage power supplies up to 200kV for ion acceleration, fast high voltage bipolar power supplies for ion beam scanning, and high voltage power supplies for secondary electron suppression.
| maker | WEB site | models |
|---|---|---|
| Applied Materials | https://www.appliedmaterials.com/semiconductor/products/ion-implant |
VIISTA® 3000XP VIISTA® 900 3D VIISTA® 900XP VIISTA® HCP VIISTA® PLAD VIISTA® TRIDENT |
| Varian Semiconductor Equipment (now Applied Materials) | ||
| Axcelis | https://www.axcelis.com/ |
Purion H Purion Dragon Purion H200 Purion XE Purion EXE Purion VXE Purion Xemax Purion XE Purion M |
| Nissin | https://www.nissin-ion.co.jp/en/ |
IMPHEAT EXCEED400HY EXCEED3000AH/-Ev/-Evo/-Evo2 EXCEED9600A/-Ev/-Evo/-Evo2 |
| SEN | https://shi-ion.jp/english/ |
SHX-Ⅲ(HC) NV-GSDⅢ-180 MC3-Ⅱ(MC) S-UHE(HE) SS-UHE(HE) Saion |
| Ulvac | https://www.ulvac.com/systems/IonImplanter |
IMX-3500 SOPHI-200/260 IH-860 |
| AIBT | https://www.aibt.com.tw/ | iPulsar Plus |
- Related words:
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- vacuum
- ion
- electromagnet
- accelerator
- surface modification
- mass spectrometry
- scanning
- semiconductor
- dose volume
- doping
- ion beam implantation
Recommended products
Matsusada Precision offers a wide variety of high voltage power supplies such as high voltage filament power supplies for ion sources, high voltage power supplies for extraction grids, constant current power supplies for analyzer magnets, high voltage power supplies up to 200kV for ion acceleration, fast high voltage bipolar power supplies for ion beam scanning, and high voltage power supplies for secondary electron suppression.
