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A focused ion beam (FIB) system scans a sample surface with an extremely thin, focused ion beam.
Ion beam scanning is used for sample surface observation, sputtering, deposition, etching, cross-sectional processing observation for Scanning Electron Microscope (SEM), sample preparation for Transmission Electron Microscopy (TEM), and film forming by deposition. The ability to precisely irradiate ion beams can also be used to repair defective areas or remove additional areas of photomasks for semiconductor manufacturing equipment. The focused ion beam photomask repair system is specialized in focused ion beam (FIB) technology.

In the ion source, ions are extracted by applying an electric field between gallium Liquid Metal Ion Sources (LMIS) and extraction electrodes. When the extracted ions are accelerated by the high-voltage electric field of the lens section and collide with the sample, secondary electrons and atoms are emitted. The beam can be narrowed by increasing the acceleration voltage of the lens section. However, at the same time, damage to the sample will increase. Therefore, the acceleration voltage is generally +5kV to +30kV.

Matsusada Precision's High Voltage Power Supplies such as HIB series provide multiple outputs and high stability designed for ion beam application.
We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.

Focused Ion Beam (FIB)
Related words:
  • Focused Ion Beam
  • Sputtering
  • Etching
  • Cross-sectional processing observation
  • TEM sample preparation
  • Film deposition
  • Photomask
  • Mask repair
  • High voltage power supply
  • Ion beam power supply
  • Low noise power supply

Recommended products

We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.

HIB series

HIB series

voltage range
60 kV
current
5 A
Ion Beam Power Supply

The rack mountable HIB series provides stable ion beam power, where each channel can be selected separately.

AE series

AE series

voltage range
1 to 150 kV
current
0.2 to 30 mA
power
15 to 120 W
Ultra low noise and high stability
High Voltage Power Supply

The AE/AF series can provide high reliability (low ripple of 10ppm) and drastically reduce noise with our proprietary switching circuit

AU series

AU series

voltage range
1 to 120 kV
current
0.25 to 2200 mA
power
30 to 2200 W
Rack-mount type High Voltage Power Supply

Choose from over 300 available models of the low-profile, lightweight design from the AU series, offering remote control & monitor functions; digital interface available.

K3-R series

K3-R series

voltage range
±1 to ±10 kV
current
0.3 to 3 mA
power
3 W
Mass spectrometry reversible power supplies

Ideal for Scanning Electron Microscopy and Mass spectrometry

K12-R series

K12-R series

voltage range
±10 to ±30 kV
current
0.4 to 1.2 mA
power
12 W
Reversible Polarity & High Stability

Ideal for Mass spectrometry

S series

S series

voltage range
0.6 to 30 kV
current
0.08 to 50 mA
power
1.5 to 30 W
Standard High Voltage Power Supply Modules

Detachable input connectors

TA series

TA series

voltage range
1 to 2 kV
current
0.7 to 1.5 mA
Ultra-compact High Voltage Power Supply for PMT

Low ripple, Space-saving, and High reliability

TC series

TC series

voltage range
1 to 2 kV
current
0.7 to 1.5 mA
Ultra-compact High Voltage Power Supply for PMT

Low ripple, Space-saving, and High reliability