Focused Ion Beam (FIB)

A focused ion beam (FIB) processes the surface of a sample using an extremely fine ion beam.
In a FIB system, the ion beam can be scanned across the sample surface for various purposes, including observation, sputtering, and deposition. FIBs are often used together with SEM, and are called FIB-SEMs. This technology is used for applications such as sample surface observation, sputtering, etching, preparing cross-sections for Scanning Electron Microscope (SEM) analysis, creating samples for Transmission Electron Microscopy (TEM), and film deposition. This precise ion beam irradiation is also utilized for photomask repair in semiconductor manufacturing, where it can correct defects by either depositing or removing material. Systems designed specifically for this purpose are known as FIB photomask repair systems.

In the ion source, ions are extracted by applying an electric field between a gallium Liquid Metal Ion Source (LMIS) and an extraction electrode. When the extracted ions are accelerated by the high-voltage electric field of the lens section and collide with the sample, secondary electrons and atoms are emitted. The beam can be narrowed by increasing the acceleration voltage of the lens section. However, at the same time, damage to the sample will increase. Therefore, the acceleration voltage is generally +5kV to +30kV.

Matsusada Precision's High Voltage Power Supplies such as HIB series provide multiple outputs and high stability designed for ion beam application.
We also have a selection of low-noise, Chassis mount High Voltage Power Supplies and PCB mount High Voltage Power Supply Modules for ion source extraction electrodes, and ion acceleration.

FIB, FIB-SEM Manufacturers

Thermo Fisher Scientific (FEI Company) - Focused Ion Beam Scanning Electron Microscopes
Hitachi High-Technologies - Focused Ion Beam Systems (FIB/FIB-SEM)
JEOL - MultiBeam System (FIB)
Carl Zeiss - Crossbeam Family
RAITH - FIB-SEM VELION
CIQTEK - FIB-SEM | DB550

FIB column (FIB gun) Manufacturers

ORSAY PHYSICS - FIB
Focus GmbH - Ion Sources
Kimball Physics - Ion Gun Systems
Ionoptika - Ion Beam Manufacturers
ULVAC-PHI - Products:Componets/FIG-5
A&D - EB / FIB

FIB ion source (Gallium liquid metal ion sources: Ga+ LMIS) Manufacturers

Applied Physics Technologies (APT) - Ion Sources
Applied Beams LLC - Liquid Metal Ion Sources for FEI / TFS

Related words:

Focused Ion Beam
Sputtering
Etching
Cross-sectional processing observation
TEM sample preparation
Film deposition
Photomask
Mask repair
High voltage power supply
Ion beam power supply
Low noise power supply

Recommended products

We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.

HIB series

voltage range: 60 kV

current: 5 A

Ion Beam Power Supply

The rack-mountable HIB series provides stable ion beam power, where each channel can be selected separately.

AE series

voltage range: 1 to 150 kV

current: 0.2 to 30 mA

power: 15 to 120 W

Ultra low noise and high stability
High Voltage Power Supply

The AE series provides high reliability (low ripple of 10 ppm) and drastically reduces noise, thanks to its proprietary switching circuit.

AU series

voltage range: 1 to 120 kV

current: 0.25 to 2200 mA

power: 30 to 2200 W

Rack mount High Voltage DC Power Supply

The AU series offers a low-profile, lightweight design with over 300 models. It features remote control and monitoring functions, with a digital interface available.