Focused Ion Beam (FIB)

A Focused Ion Beam (FIB) system utilizes a finely focused beam of ions to process sample surfaces with nanometer-scale precision.
Unlike Scanning Electron Microscopes (SEM) that use electrons for imaging, FIB systems typically use Gallium ions to physically sputter material. This allows for precise cutting, cross-sectioning, and deposition. FIB columns are often integrated with SEM columns in "DualBeam" or FIB-SEM systems, enabling simultaneous processing and high-resolution observation.
Key applications include semiconductor circuit modification, photomask repair, and the preparation of ultra-thin samples for Transmission Electron Microscopy (TEM).Defects can be corrected by depositing conductive or insulating materials, or by removing excess material through sputtering.

In the ion column, ions are extracted by applying a high electric field between a Liquid Metal Ion Source (LMIS), typically Gallium, and an extraction electrode. These ions are then accelerated through the column and focused onto the sample surface using electrostatic lenses.
While increasing the acceleration voltage can reduce the beam spot size (improving resolution), higher energy ions cause greater damage to the sample surface. Conversely, lower voltages reduce damage but may result in a larger spot size. Therefore, the acceleration voltage is typically adjusted between +5 kV and +30 kV depending on the application requirements.

Matsusada Precision offers high-performance high-voltage power supplies, such as the HIB series, specifically engineered for focused ion beam applications. The HIB series features multiple floating outputs required for ion sources, extraction, and acceleration in a compact rack-mount design.
We also provide a wide selection of low-noise chassis-mount and PCB-mount high-voltage modules ideal for integrating into FIB columns and ion gun systems.

FIB, FIB-SEM Manufacturers

Thermo Fisher Scientific (FEI Company) - Focused Ion Beam Scanning Electron Microscopes
Hitachi High-Technologies - Focused Ion Beam Systems (FIB/FIB-SEM)
JEOL - MultiBeam System (FIB)
Carl Zeiss - Crossbeam Family
RAITH - FIB-SEM VELION
CIQTEK - FIB-SEM | DB550

FIB column (FIB gun) Manufacturers

ORSAY PHYSICS - FIB
Focus GmbH - Ion Sources
Kimball Physics - Ion Gun Systems
Ionoptika - Ion Beam Manufacturers
ULVAC-PHI - Products:Componets/FIG-5
A&D - EB / FIB

FIB ion source (Gallium liquid metal ion sources: Ga+ LMIS) Manufacturers

Applied Physics Technologies (APT) - Ion Sources
Applied Beams LLC - Liquid Metal Ion Sources for FEI / TFS

Related Terms:

Focused Ion Beam
Sputtering
Etching
Cross-sectional processing observation
TEM sample preparation
Film deposition
Photomask
Mask repair
High voltage power supply
Ion beam power supply
Low noise power supply

Recommended products

We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.

HIB series

Voltage Range: Up to 60 kV

Current: eg, 5 A

Ion Beam Power Supply

The rack-mountable HIB series provides stable ion beam power and allows for individual channel selection.

AE series

Voltage Range: 1 to 150 kV

Current: 0.2 to 30 mA

Power: 15 to 120 W

Ultra-Low Noise and High Stability
High Voltage Power Supply

The AE series provides high reliability (low ripple of 10 ppm) and drastically reduces noise, thanks to its proprietary switching circuit.

AU series

Voltage Range: 1 to 120 kV

Current: 0.25 to 2200 mA

Power: 30 to 2200 W

Rack Mount High-Voltage Power Supply

The AU series features a low-profile, lightweight design and is available in over 300 models. It supports remote control and monitoring, with a digital interface option.