Electron beam lithography is the application of electron beam processing equipment and scanning electron microscope technology to make semiconductor reticles used in the production of LSIs. Electron beam lithography is also called e-beam lithography (EB lithography) or EBL. The reticle, also called a photomask, serves as a master template for transferring a circuit pattern onto a semiconductor wafer.
In electron beam lithography, an electron beam (E beam) emitted from an electron gun is focused into a very small spot by an electron lens. By precisely controlling the focused electron beam and the stage movement, the system draws the desired pattern onto a substrate coated with an electron-sensitive resist. This high-precision control technology is derived from advancements in electron beam processing and scanning electron microscopy.
High-precision, high-voltage power supplies are essential for operating the electron gun and electron lenses within an EBL system.
Matsusada Precision offers power supplies for electron guns and electron lenses for electron beam lithography equipment. These high-voltage power supplies can also be customized to meet customer requirements.
- Related words:
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- electron gun
- electron beam
- electron beam writing
- electron lens
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We offer power supplies for electron guns and electron lenses for electron beam lithography systems. These high-voltage power supplies can also be customized to meet your requirements.
