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Ion milling is a sample preparation technique that uses a broad beam of argon ions to polish or etch a sample's surface for subsequent observation and analysis.

Mechanical polishing of soft materials, such as copper and aluminum, often introduces artifacts like smearing and thermal deformation. With ceramics and silicon, cracks are more likely to occur while polishing. Thin films are also difficult to machine polish with conventional methods. Meanwhile, processing with an ion milling device is designed to prepare samples according to purposes, and you can use appropriate materials for the observation.

Furthermore, while chemical etching has been required to observe crystals in metallic materials, ion milling reduces man-hours by using an argon ion milling device with ion beam etching. For highly precise, site-specific milling, a Focused Ion Beam (FIB) system is often used. Unlike broad-beam argon milling, FIB utilizes a finely focused gallium ion beam. These systems are frequently integrated with a Scanning Electron Microscope (SEM) in a dual-beam configuration (FIB-SEM) to allow for simultaneous processing and high-resolution imaging. FIB uses a gallium ion beam.

Ion milling is divided into cross-section milling and flat milling. Cross-section milling is suitable for cross-sectional observation of each layer's thickness, layer structure, and surface finish because it can generate cross-sections without applying external stress. Flat milling is used for final finishing to create a large, smooth, and artifact-free surface. This is achieved by directing the ion beam at a very low, or grazing, angle relative to the sample surface, which preferentially removes asperities and reduces topography.

The acceleration voltage of the beam in ion milling is typically 1 kV to 8 kV. Matsusada Precision offers a range of compact high-voltage power supplies that provide stable output voltages from 1 kV to 10 kV, making them ideal for ion milling applications.

Ion Milling
Related Terms:
  • FIB
  • Ion beam
  • Sample preparation
  • Thin film
  • Surface polishing
  • Cross-section observation
  • Ion
  • Surface processing
  • SEM
  • Etching

Recommended products

Matsusada Precision offers a range of compact high-voltage power supplies that provide stable output voltages from 1 kV to 10 kV, making them ideal for ion milling applications.

HIB series

HIB series

Voltage Range
Up to 60 kV
Current
eg, 5 A
Ion Beam Power Supply

The rack-mountable HIB series provides stable ion beam power, where each channel can be selected separately.

AKP series

AKP series

Voltage Range
1 to 120 kV
Current
0.1 to 13 A
Power
12 to 13 kW
High-voltage High-current power supply

The AKP series is a high-voltage, high-current power supply. It supports scalable power output up to 52 kW via master-slave parallel operation.

AK series

AK series

Voltage Range
1 to 120 kV
Current
25 to 4250 mA
Power
3 to 6.4 kW
High power 6.4 kW/Compact
High Voltage Power Supply

The AK series delivers high power (6.4 kW) in a compact 4U package. Digital interface is available.

RSS series

RSS series

Voltage Range
1 to 20 kV
Current
0.25 to 30 mA
Power
5 to 30 W
High power & Low Noise High Voltage Power Supplies

Compact, high stability and low noise

TM series

TM series

Voltage Range
0.8 to 3 kV
Current
0.5 to 2 mA
Power
1.5 W
Ultra Low Ripple PCB Mountable High Voltage Power Supply

Low noise due to 6-sided metal shielding

TC series

TC series

Voltage Range
1 to 2 kV
Current
0.7 to 1.5 mA
Power
1.4 or 1.5 W
Ultra-compact High Voltage Power Supply for PMT

Low ripple, Space-saving, and High reliability

R4K-80 series

R4K-80 series

Voltage Range
16 to 320 V
Current
0.5 to 10 A
Power
80 W
Ultra-Slim DC Power Supply with 4-digit Display

Various models for output current control in 0.1 mA increments

R4K-36 series

R4K-36 series

Voltage Range
2 to 40 V
Current
0.1 to 4 A
Power
0.2 to 36 W
Ultra Compact Desktop DC Power Supply

Silent operation with natural convection cooling