An ion beam is a beam produced by accelerating ions at high speed. Ion is an atom or mass of atoms that are positively or negatively charged. Ion acceleration is to move an ion to the destination by applying an arbitrary voltage. The momentum of acceleration increases in proportion to the magnitude of the applied voltage. According to applications of ion transfer, electrodes to apply the voltage are known for accelerating electrode, extraction electrode, suppressing electrode, deflecting electrode, deflecting electrode, etc. They are used in ion engines, ion beam sputtering, ion implantation, focused ion beam (FIB), and accelerators. In order to prevent the potential inside the device from being biased against the accelerating ion potential, there are some cases where it may be electrically neutralized by generating ions to the accelerating one. The device is called "Neutralizer".
To generate an ion beam for FIB, a liquid metal ion source (LMIS) consisting of a needle-shaped tungsten filament with gallium attached is used. When the filament is heated and voltage is applied to the extraction electrode, an ion beam is generated from the tip. The generated ions are then controlled by the accelerator's electric and magnetic fields to form a narrow, directional stream. Ion beam steering is used in ion beam scanning. Ions that are extracted from the ion source are focused by a condenser lens (CL), and the ion beam is scanned by an electrostatic deflector. Ion beams are used for a wide range of applications such as ion beam implantation, ion beam processing, and scanning ion microscope (SIM).
The ion beam generator consists of an ion source (ion gun), an electromagnetic lens in the accelerator, and a deflector. The ion beam passes through an accelerator and is used for ion implantation of impurities into semiconductors, surface cleaning by ion milling, surface processing, surface modification, and surface and internal analysis. The ion beam is accelerated and decelerated by an electric field in a vacuum and deflected by a magnetic field. Ion mass sorting is performed by bending the ions in a magnetic field, and energy analysis is performed by decelerating the electric field method and electrostatic field deflection analysis method.
Matsusada Precision offers a variety of power supply equipment for ion acceleration, extraction, suppression, deflection, focusing, gridding and neutralization. Matsusada Precision power supplies designed for electrostatic deflectors have various kinds of specifications, and especially we provide high voltage amplifiers featuring the world's highest level of response speed. With the DC bias function, the scanning reference point of scanning can be easily adjusted.
- Ion source conceptual diagram
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- Related words:
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- ion beam
- ion source
- ion gun
- acceleration
- ion acceleration
- accelerator
- ion implantation
- impurity implantation
- beam transport deflection
- surface processing
- surface modification
- electrostatic deflection (including ion beam steering)
- ion milling
- electrostatically controlling ion beams
- electrostatic lenses
Recommended products
Matsusada Precision offers ion beam power supplies that combine power supplies for ion extraction, acceleration, deflection, focusing, and grid grids, as well as power supply devices that can be used for each of these applications.
