Plating is generally regarded as ion plating. The plating process technology is used in the space development in the United States. There are two major methods of plating process: wet plating and dry plating (vacuum plating), and ion plating belongs to the latter. In the process, the material is evaporated or sublimated in a vacuum, and the evaporated particles are passed through the plasma. Then, the positively charged object is attracted to a negatively charged object and deposited there. Finally, the desired film is formed.