HV Power Supplies designed for Ion Implanting application with diverse output range from 30 W to 6.4 kW are available, which will meet the low, middle and high power requirements for Ion Implantation. Highly stable and quite low noise output secure the high performance of Ion Implanting, and HV amplifiers or system supply with integrated floating output are also available.

Various high voltage power supplies with high reliability and compact sizes are offered for ion injection. Furthermore, the GP series adopts optical fiber communication and highly reliable communication is expected. It supports all models including low voltage RE, RF, RG and RK and allows reduction of the time to develop different software for each model to be used in control or measurement. This leads to great reduction of device development time.